Using PECVD Technology to Manufacture Environmental Products to Meet Consumer Demand and Improve Productivity

Abstract

Plasma Enhanced Chemical Vapor Deposition (PECVD) method as laboratory equipment, the film composition and deposition rate is determined by the electron temperature and the plasma density distribution. But thus coating process machinery temperatures up 1000℃, the experimental of the substrate resulting in a difference changes, it should be possible to let the system be deposited coating may be at the operating temperature of 500℃, to avoid particles and phase transitions of issues that affect the quality of the film. The objectives of this research hoping to be testing the effectiveness of high-tech chemical vapor deposition coating methods, to get the best combination of parameters via experiments, in order to enhance product quality and thereby reducing coating process costs, while increasing the content of titanium in the coating adhesion is increased. The contributions of this manuscript by experimental design theory compile a pre-test parameters through experience, and practical application of the system of plated products and found that titanium nitride film oxidation temperature of 300℃, the maximum bond strength, showing Taguchi engineering in PECVD the feasibility of coating, while allowing the entire system of coating processes and product quality to reach environmental regulations in the areas of the world.